学術論文(Paper)
�@Hideto TAKEKIDA and Kenichi NANBU
　　Weighting Factor for particle modeling of Axisymmetrical Plasmas
JPSJ: journal of physical society of japan　Vol　73、No　3　756

�A Hideto TAKEKIDA and Keinchi NANBU
　　Particle Modeling of Plasma Confinement by a Multipolar Magnetic Field　
Journal　of Physics D: Applied Physics 　　Vol． 37　(2004) 1800

�BHideto TAKEKDIA and Kenichi NANBU
　　Effect of Driving Frequency on the Electron Energy Probability Function
　　of Capasitively Coupled Argon Plasmas
-Comparison between Simulation and Experiment-
　JJAP: Japanese Journal of Applied Physics Vol. 43, No. 6A, 2004, 3590

�CHideto TAKEKIDA and Kenichi NANBU
Particle modeling of non-collisional heating of
　　　　　　　　　　　　　　　inductively-coupled argon plasmas
　Thin Solid Films Vol.506-507, 2006, 729-733

�DHideto TAKEKIDA and Kenichi NANBU
Three-dimensional particle modeling of plasmas in a reactor with multipolar magnetic field
　AIP Conf. Proc. 24th Int. Symp. on Rarefied Gas Dynamics Vol. 762 pp. 1107-1112

�EHideto TAKEKIDA and Kenichi NANBU
　Particle modeling of inductively-coupled plasmas with wafer biasing
　Journal　of Physics D: Applied Physics, Vol. 38(2005), pp.3461-3468

�FKenichi NANBU, Takashi HURUBAYASHI and Hideto TAKEKIDA
Coulomb collisions in material processing plasmas
　Thin Solid Films Vol. 506-507, 2006, pp. 720-723.

�GHideto TAKEKIDA and Kenichi NANBU
　Effect of multipolar magnetic field on the electron density in a plasma reactor
　IEEE Transactions on Plasma Science, Vol. 33, No.2, 344

�HHideto TAKEKIDA and Kenichi NANBU
　Self-consistent Particle Modeling of Induvtively Coupled CF4 Discharges and Radicals Flow
　IEEE Transactions on Plasma Science, Vol.34, No.3, June 2006, 973-983

�IHideto TAKEKIDA and Kenichi NANBU
　　Self-consistent Particle Modeling of Induvtively-coupled CF4 Discharges
　　-Effect of wafer biasing-
　　JJAP: Japanese Journal of Applied Physics No.45 3A pp.1805-1818.